| 发明名称 | Mask plate | ||
| 摘要 | A mask plate is used for implementing a graphic structure with a narrower line width on a target substrate. The mask plate includes a slit-shaped photic area and a lightproof area. An edge of the slit-shaped photic area is in a curve shape. | ||
| 申请公布号 | US9529252(B2) | 申请公布日期 | 2016.12.27 |
| 申请号 | US201214395711 | 申请日期 | 2012.12.04 |
| 申请人 | BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. | 发明人 | Xie Zhenyu;Guo Jian |
| 分类号 | G03F1/50;G03F1/00;G02B27/09 | 主分类号 | G03F1/50 |
| 代理机构 | Ladas & Parry LLP | 代理人 | Ladas & Parry LLP |
| 主权项 | 1. A mask plate, comprising a slit-like light-transparent region and lightproof regions, and bumps that are disposed outside ends of each of edges of the slit-like light-transparent region respectively, wherein an edge of the slit-like light-transparent region is in a curve shape. | ||
| 地址 | Beijing CN | ||