发明名称 O2 AND H2O BARRIER MATERIAL
摘要 O2 and H2O barrier materials suitable for the protection of LCDs and flexible OLEDs are fabricated on a polymer substrate using dense inorganic barrier layers. A polymer surface having a low surface roughness has an inorganic layer of aluminum or silicon oxides deposited thereupon using ion-assisted vacuum deposition with an argon ion gun, which treatment surprisingly provides a smoothing effect on the surface of the polymer. By pretreatment of prefabricated polymeric film with ion-gun enhanced plasma in the presence of oxygen, commercially available heat-stabilized PET and PEN films can be directly employed as substrates. Protective polymer layers are optionally coated upon the thin inorganic barrier layer.
申请公布号 WO02091064(A2) 申请公布日期 2002.11.14
申请号 WO2002US14218 申请日期 2002.05.01
申请人 GENERAL ATOMICS;ZIEGLER, JOHN, P.;PINER, JOHN, R. 发明人 ZIEGLER, JOHN, P.;PINER, JOHN, R.
分类号 B32B27/06;G02F1/1333;H01L51/52 主分类号 B32B27/06
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