METHOD FOR PRODUCING NOVEL ALI CYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER

摘要

Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.

主权项

1. A method for producing an alicyclic ester compound expressed by general formula (1):where R1 represents a hydrogen atom or a methyl group, R2 and R3 may be the same as, or different from, each other and independently represent a hydrogen atom, a hydroxyl group, a cyclic, linear or branched alkyl group having a carbon number of 1 to 10, an aryl group, a cycloalkyl group, an alkoxy group having a carbon number of 1 to 10, an aryloxy group, an acyloxy group having a carbon number of 2 to 6, or a halogen group, and R4 represents a linear or branched alkylene group having a carbon number of 2 to 5;
the method comprising reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid:where R2 and R3 are the same as those in chemical formula (1);
[Chemical Formula 3] H2N—R4—OH   (3)where R4 is the same as that in chemical formula (1);where R2, R3 and R4 are the same as those in chemical formula (1).