| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to reduce contamination by replacing easily a substrate under a projection system with another substrate under the projection system. A lithographic apparatus includes a substrate table(WT1,WT2) for supporting a substrate. The substrate table includes a main part and an edge part having a moveable structure. When the edge part is in a first position, the edge part has a top surface which is practically in the same plane as a top surface of the main part. The edge part indicates an outer edge of the substrate table on the basis of a plane figure. The edge part is moveable relatively to the main part of the substrate table to a second position at which the edge part does not form an outer edge of the substrate table. The edge part is rotatable with respect to a hinge from the first position to a retracted part in which the edge part does not form an outer edge of the substrate table on the basis of the plane figure.</p> |
