EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD, AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure method capable of maintaining exposure accuracy when exposing by irradiating a substrate with exposure light via a projection optical system and liquid.SOLUTION: An exposure method comprises the steps of: forming an immersion area locally between a top face of a movable body, which is movable while holding a substrate, and a projection optical system; irradiating the substrate with exposure light via the projection optical system and liquid to form the immersion area; and scanning and exposing each of a plurality of shot regions on the substrate by moving the substrate against the exposure light. Travel speed of the substrate is determined according to respective positions of the plurality of shot regions on the substrate.