| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target capable of depositing a transparent conductive oxide film enabling DC (direct current) sputtering, and excellent in etching property, alkali resistance, heat resistance and environmental resistance.SOLUTION: A sputtering target comprises an oxide having the content ratio of metal component elements in which the total of at least one kind or two kinds of Al and Ga is 0.1 atm% or higher and 15.0 atm% or lower, and the total of at least one kind or two or more kinds of Y, La, Nb and Bi is 1.0 atm% or higher and 20.0 atm% or lower, to the whole metal component element amount, and the residue comprises Zn and inevitable impurities.SELECTED DRAWING: None |
