发明名称 Vapor deposition mask with metal plate
摘要 Provided are: a vapor deposition mask which can be light weight and have high definition even when the size is increased; a method for producing a vapor deposition mask device whereby it is possible to accurately position the aforementioned vapor mask on a frame; and a method for producing an organic semiconductor element whereby it is possible to produce a high-definition organic semiconductor element. A metal mask on which slits are disposed, and a resin mask which is positioned on the surface of the metal mask and on which multiple openings corresponding to the pattern formed by means of vapor deposition are horizontally and vertically arranged in rows are laminated.
申请公布号 US9527098(B2) 申请公布日期 2016.12.27
申请号 US201514719355 申请日期 2015.05.22
申请人 Dai Nippon Printing Co., Ltd. 发明人 Hirobe Yoshinori;Matsumoto Yutaka;Ushikusa Masato;Takeda Toshihiko;Nishimura Hiroyuki;Obata Katsunari;Takekoshi Takashi
分类号 B05B15/04;C23C14/04;H01L51/00;B05C21/00;B32B37/18;B32B38/00;H01L51/56 主分类号 B05B15/04
代理机构 Burr & Brown, PLLC 代理人 Burr & Brown, PLLC
主权项 1. A metal mask with a resin plate, comprising: slits located in the metal mask, the slits having a length running in a lengthwise direction and a width running in a crosswise direction, wherein the resin plate is bonded on one surface of the metal mask, and openings within the resin plate that define a deposition pattern to be produced by vapor deposition, a plurality of the openings overlapping each of the slits and being located in correspondence within each of the slits.
地址 Tokyo JP