发明名称 APPARATUS AND METHOD FOR POLISHING OBJECTS USING OBJECT CLEANERS
摘要 An apparatus and method for polishing objects, such as semiconductor wafers, uses at least one object cleaner, which may be a movable object cleaner. The movable object cleaner allows access to different parts of the apparatus for maintenance.
申请公布号 WO2007030779(A3) 申请公布日期 2007.09.20
申请号 WO2006US35183 申请日期 2006.09.08
申请人 INOPLA INC. 发明人 JEONG, IN, KWON
分类号 B24B37/04 主分类号 B24B37/04
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