| 摘要 |
The present invention provides a photosensitive resin composition, which has an excellent sensitivity, coating property and liquid crystal fouling (electric characteristic). The positive type photosensitive resin composition for an electron member of the present invention comprises (A) a polymer manufactured by copolymerizing (a1) a constitution unit having an acidic radical with residue groups protected by an acid labile group, and (a2) a constitution unit having a cross linking group, (B) a photo acid generator, and (C) a chain aliphatic epoxy compound. |
