| 摘要 |
PROBLEM TO BE SOLVED: To obtain the radiation sensitive resin composition capable of forming a rectangular resist pattern in high resolution and superior in sensitivy and developability and dimensional fidelitty by incorporating a specified alkali- soluble block-copolymer and a compound capable of cross-linking the block- copolymer components in the presence of an acid and a radiation sensitive acid generator. SOLUTION: This radiation sensitive resin composition comprises the compound capable of cross-linking the block-copolymer components in the presence of an acid and the radiation sensitive acid generator and the alkali-soluble block-copolymer having essential repeating units represented by formula I and as the case may be, block units having the repeating units represented by formula II and formula III in which each of R<1> , R<2> , R<3> , R<5> , and R<6> is, independently, an H atom or a methyl group; each of R<4> and R<8> an H atom, a phenyl, cyano group or the like; and each of R<5> and R<9> is an H atom, a cyano group or the like. |
