发明名称 TREATMENT LIQUID FILTRATION APPARATUS, CHEMICAL LIQUID SUPPLY DEVICE, TREATMENT LIQUID FILTRATION METHOD, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To shorten work time in filtering treatment liquid used for a chemical liquid supply device for supplying chemical liquid to an object to be treated from a chemical liquid supply source through a chemical liquid flow channel and a nozzle.SOLUTION: A chemical liquid supply device includes a first airtight vessel 31 and a second airtight vessel 32 in which treatment liquid is accumulated respectively, and a filter part 4 provided to a flow channel to send the treatment liquid from one of the first and second airtight vessels 31 and 32 to the other. When the treatment liquid is sent from one of the first and second airtight vessels 31 and 32 to the other, the treatment liquid passes through the filter part 4 so that foreign matter in the treatment liquid is removed. Sending of the treatment liquid between the first and second airtight vessels 31 and 32 is performed by depressurizing the destination airtight vessel so that a moving amount of the treatment liquid per unit time is larger than in a case where the treatment liquid is sent using a pump, thereby shortening work time required for treatment liquid filtration processing.SELECTED DRAWING: Figure 2
申请公布号 JP2016128156(A) 申请公布日期 2016.07.14
申请号 JP20150003561 申请日期 2015.01.09
申请人 TOKYO ELECTRON LTD 发明人 OTSUKA YUKINOBU
分类号 B01D24/48;B01D29/60;B01D29/90;B05C11/10;H01L21/027;H01L21/304 主分类号 B01D24/48
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