| 摘要 |
A wafer holder furnished with a plurality of anchored tubular pieces and/or anchored support pieces affixed to the holder's ceramic susceptor and in which damage to the anchored tubular pieces due to thermal stress during heating operations is prevented, and a high-reliability semiconductor manufacturing apparatus utilizing the wafer holder are made available. One end of at least two of the anchored tubular pieces ( 5 ) and/or anchored support pieces is affixed to the ceramic susceptor ( 2 ) and the other end is fixed in the reaction chamber ( 4 ), wherein letting the highest temperature the ceramic susceptor ( 2 ) attains be T1, the thermal expansion coefficient of the ceramic susceptor ( 2 ) be alpha1, the highest temperature the reaction chamber ( 4 ) attains be T2, the thermal expansion coefficient of the reaction chamber ( 4 ) be alpha2, the longest inter-piece distance on the ceramic susceptor ( 2 ) among the plurality of anchored tubular pieces ( 5 ) and/or anchored support pieces at normal temperature be L1, and the longest inter-piece distance on the reaction chamber ( 4 ) among the plurality of anchored tubular pieces ( 5 ) and/or anchored support pieces at normal temperature be L2, then the relational formula |(T1xalpha1xL1)-(T2xalpha2xL2)|<=0.7 mm is satisfied.
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