发明名称 |
MEASURING PARAMETERS OF A CUT GEMSTONE |
摘要 |
Apparatus and corresponding methods for measuring a plurality of parameters of a cut gemstone while it is positioned at a single measurement location. Apparatus comprise a plurality of light sources, each configured to emit light at a different one of a plurality of emission wavelengths or ranges of wavelengths such that the emitted light illuminates at least part of the measurement location. Apparatus further comprise a sensor assembly configured to sense light at a plurality of sensing wavelengths or ranges of wavelengths for measuring the plurality of parameters. The sensed light is received at the sensor assembly from the measurement location as a result of illumination of a cut gemstone located at the measurement location. |
申请公布号 |
US2016178530(A1) |
申请公布日期 |
2016.06.23 |
申请号 |
US201414905318 |
申请日期 |
2014.07.17 |
申请人 |
DE BEERS UK LTD |
发明人 |
DAVIES Nicholas Matthew;D'GAMA Siobhan;ROSE Peter Stanley;WILLS Maxwell Ralph |
分类号 |
G01N21/87;B07C5/342;G01N21/65;G01N21/39;G01N21/64 |
主分类号 |
G01N21/87 |
代理机构 |
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代理人 |
|
主权项 |
1. An apparatus for measuring a plurality of parameters of a cut gemstone while it is positioned at a single measurement location, the apparatus comprising:
a plurality of light sources each configured to emit light at a different one of a plurality of emission wavelengths or ranges of wavelengths such that the emitted light illuminates at least part of the measurement location; and a sensor assembly configured to sense light at a plurality of sensing wavelengths or ranges of wavelengths for measuring the plurality of parameters, the sensed light being received at the sensor assembly from the measurement location as a result of illumination of a cut gemstone located at the measurement location. |
地址 |
London GB |