发明名称 |
HETERO JUNCTION BIPOLAR TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To make it possible to readily manufacture InP-based HBT superior in high frequency characteristics.SOLUTION: A hetero junction bipolar transistor comprises: a first base 105 formed by a p-type InGaAsSb doped with carbon; and a second base 106 formed by a p-type GaAsSb doped with carbon. The second base 106 is higher than the first base 105 in hole concentration. The first base 105 may have a hole concentration of 1×10cmor more. The first base 105 is arranged so that a region closer to the second base 106 in a laminating direction becomes lower in In composition and Sb composition and therefore, has a larger band gap (inclination in composition).SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016122734(A) |
申请公布日期 |
2016.07.07 |
申请号 |
JP20140262093 |
申请日期 |
2014.12.25 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
HOSHI TAKUYA;KAYAO NORIHIDE;KURISHIMA KENJI;SUGIYAMA HIROKI;YOKOYAMA HARUKI |
分类号 |
H01L21/331;H01L21/20;H01L29/737 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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