发明名称 HETERO JUNCTION BIPOLAR TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To make it possible to readily manufacture InP-based HBT superior in high frequency characteristics.SOLUTION: A hetero junction bipolar transistor comprises: a first base 105 formed by a p-type InGaAsSb doped with carbon; and a second base 106 formed by a p-type GaAsSb doped with carbon. The second base 106 is higher than the first base 105 in hole concentration. The first base 105 may have a hole concentration of 1×10cmor more. The first base 105 is arranged so that a region closer to the second base 106 in a laminating direction becomes lower in In composition and Sb composition and therefore, has a larger band gap (inclination in composition).SELECTED DRAWING: Figure 1
申请公布号 JP2016122734(A) 申请公布日期 2016.07.07
申请号 JP20140262093 申请日期 2014.12.25
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 HOSHI TAKUYA;KAYAO NORIHIDE;KURISHIMA KENJI;SUGIYAMA HIROKI;YOKOYAMA HARUKI
分类号 H01L21/331;H01L21/20;H01L29/737 主分类号 H01L21/331
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