| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment device and a substrate treatment method capable of preferably applying a washing treatment to a substrate. SOLUTION: A chemical liquid unit 10 performs chemical liquid treatment of a substrate W. A washing unit 60 washes the substrate W fed with the chemical liquid from the chemical liquid unit 10 by micro-bubble water by feeding micro-bubble water to the substrate W. The washing unit 60 is mainly provided with multiple upper nozzles 61, multiple lower nozzles 62, a liquid knife 66, a storage tank 20, and a micro-bubble generating part 21. This configuration enables to feed micro-bubble water to the substrate W after the chemical liquid treatment. Thus, the chemical liquid attached to the substrate in the chemical liquid treatment can be quickly substituted with the micro-bubble water, to reduce the amount of the treatment liquid used for washing. COPYRIGHT: (C)2008,JPO&INPIT |
