| 摘要 |
A salt suitable for an acid generator is provided to obtain a chemically amplified resist composition capable of forming a pattern having a high resolution and excellent pattern shape. A salt suitable for an acid generator is represented by the following formula 1, wherein X is an n-valent linking group; each of Y1 and Y2 independently represents a fluorine atom or a C1-C6 perfluorolalkyl group; n is 2 or 3; and A+ is an organic counter ion. The salt represented by formula 1 is obtained by reacting a salt represented by the following formula 4 with a compound represented by the following formula: A+ Z-. In the formulae, X, Y1, Y2, n and A+ are the same as defined above; M is Li, Na, K or Ag; and Z is F, Cl, Br, I, BF4, AsF6, SbF6, PF6 or ClO4.
|
