| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an image sensor having a microlens formed of an inorganic material. <P>SOLUTION: This manufacturing method of an image sensor includes steps of: forming an interlayer insulating film including pads on a semiconductor substrate having pixels formed thereon; forming a color filter and a planarizing layer on the interlayer insulating film; forming a first insulating film on the planarizing layer; forming a microlens mask on the first insulating film; forming the microlens mask with a seed microlens by an etching process of the first insulating film used for an etching mask; depositing a second insulating film on the seed microlens to form a microlens; and exposing the pads. The etching process of the first insulating film includes the execution with 600-1,400 W source power at 27 MHz and with 0-500 W bias power at 2 MHz. <P>COPYRIGHT: (C)2008,JPO&INPIT |
