| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition which is applied on a resist pattern when the resist pattern is heat-treated to form a fine pattern, and which can smoothly and more stably shrink the resist pattern upon heat treatment and can easily be removed by subsequent treatment with an alkaline aqueous solution, and to efficiently form a fine resist pattern using the same. <P>SOLUTION: The resin composition for fine pattern formation comprises a resin, a crosslinking component which crosslinks the resin and a solvent, wherein the resin comprises a repeating unit (I) represented by formula (1). In formula (1), R<SP>1</SP>represents a hydrogen atom, a methyl group or a trifluoromethyl group; R<SP>2</SP>represents a hydrogen atom, a linear alkoxyl group or a hydroxyl group; when R<SP>2</SP>is a hydrogen atom or a hydroxyl group, n is an integer of 2-8; when R<SP>2</SP>is a linear alkoxyl group, n is an integer of 2-7, and the carbon number of -(CH<SB>2</SB>)<SB>n</SB>-R<SP>2</SP>including the carbon number of the linear alkoxyl group is 2-8. <P>COPYRIGHT: (C)2008,JPO&INPIT |
