MANUFACTURING METHOD FOR ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY PANEL

摘要

A manufacturing method for an array substrate, an array substrate and a display panel. The manufacturing method comprises forming a first metal layer (201), an insulation layer (202), a first thin film layer (203), an etch stop layer (204), a second metal layer (205) and an inorganic layer (206) on the substrate successively; forming a photoresist layer (207) on the inorganic layer (206); forming an organic layer (208) on the inorganic layer (206) and the photoresist layer (207); forming a first through hole (210) by digging a hole in the organic layer (208) and the inorganic layer (206) in order to expose the second metal layer (205) partially; forming a second thin film layer (209) on the organic layer (208) and the exposed second metal layer (205). By this way, the damage to the metal layers can be reduced, the photomask in the manufacturing process can be reduced and the productivity can be improved.