发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor storage device in which a write characteristic of a memory cell is improved by preventing a threshold of a selection gate transistor from lowering. SOLUTION: The nonvolatile semiconductor storage device having a plurality of NAND strings, wherein each of the NAND strings comprises: a memory cell block to which a plurality of nonvolatile memory cells are serially connected; a first selection gate transistor connected to a data transfer line contact; and a second selection gate transistor connected to a source line contact. The height of the upper surface of an element separation insulating film 24 between an adjacent data transfer line contacts is higher than that of the main surface of a semiconductor substrate 23 in an element region between the first selection gate transistor and data transfer line contact. Alternatively, the height of the upper surface of the element separation insulating film 24 between the adjacent source line contacts is higher than that of the main surface of the semiconductor substrate 23 in an element region between the second selection gate transistor and source line contact. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007221084(A) 申请公布日期 2007.08.30
申请号 JP20060140327 申请日期 2006.05.19
申请人 TOSHIBA CORP 发明人 NOGUCHI MITSUHIRO
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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