发明名称 |
Mask with Registration Marks and Method of Fabricating Integrated Circuits |
摘要 |
A photomask for a lithography apparatus includes a chip pattern configured to be transferred into a resist layer on a workpiece and at least one registration mark that is configured not to be transferred into the resist layer. Mask qualification may be improved without impacting wafer level processes.
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申请公布号 |
US2009075178(A1) |
申请公布日期 |
2009.03.19 |
申请号 |
US20070855234 |
申请日期 |
2007.09.14 |
申请人 |
QIMONDA AG |
发明人 |
JAHNKE ANDREAS;ZIEBOLD RALF;MAEHR TORSTEN |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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