| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method utilizing substrate stage compensation. <P>SOLUTION: The lithographic apparatus has an illumination system that conditions a radiation beam, and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto the target of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, and a base frame. The substrate support drive is configured to generate a force at least in one direction between the substrate support and the reaction mass, the balance mass, or the support frame. <P>COPYRIGHT: (C)2007,JPO&INPIT |
