发明名称 |
A magnetoresistive head and a manufacturing method thereof |
摘要 |
<p>To reduce influence of etching damage at junction edge of a magnetoresistive film in the sensor height direction, moreover lower deterioration of dielectric breakdown voltage between an upper magnetic shield layer and a lower magnetic shield layer, and maintain electrostatic capacity to a small value in a CPP magnetoresistive head. The length in the sensor height direction of bottom surface of a pinning layer (13) is longer than the length in the sensor height direction of bottom surface of a first ferromagnetic layer (14), angle formed by an edge in the sensor height direction of the pinning layer (13) to the surface extended from bottom surface of a magnetoresistive film is smaller than the angle formed by an edge in the sensor height direction of a second ferromagnetic layer (16) to the surface extended from bottom surface of the magnetoresistive film, and height of top surface of a sensor height direction refill film (18) is equal to or higher than the top surface of the magnetoresistive film.
</p> |
申请公布号 |
EP1818915(A3) |
申请公布日期 |
2008.02.06 |
申请号 |
EP20070250152 |
申请日期 |
2007.01.16 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. |
发明人 |
WATANABE, KATSURO;SHINTANI, TAKU |
分类号 |
G11B5/39;G11B5/31 |
主分类号 |
G11B5/39 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|