发明名称 METHOD FOR ANALYZING DEFECT DATA AND INSPECTION APPARATUS AND REVIEW SYSTEM
摘要 The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.
申请公布号 US2009105990(A1) 申请公布日期 2009.04.23
申请号 US20080341657 申请日期 2008.12.22
申请人 SHIBUYA HISAE;TAKAGI YUJI 发明人 SHIBUYA HISAE;TAKAGI YUJI
分类号 G06F15/00;H01L21/66;G01N21/95;G06T7/00 主分类号 G06F15/00
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