| 摘要 |
The present invention is a method for treating a washing tank that, in a step for manufacturing a semiconductor wafer, is used in a washing step in which an acidic washing fluid is used, wherein the method for treating a washing tank is characterized in that the washing tank is washed with an alkali washing fluid before the washing tank is used. It is thereby possible to provide a method for treating a washing tank in which contamination by an organic substance and the like in the washing tank that is used in the washing step in which an acidic washing fluid is used is rapidly removed, and a washing tank capable of washing a wafer at a consistent particle level can be obtained. |
