发明名称 MICRO MACHINING METHOD FOR FORMING PERFECT EXTERIOR CORNER ON ETCHABLE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a three-dimensional structure having perfect projecting corners by etching. SOLUTION: The method for obtaining a desired structure includes a process for separating a substrate in two structures (502-504 and 505) so that the exterior corners are formed by the crossing (506) of a first structure and a second structure on the substrate (501), a process for forming an etching mask on a surface and the substrate of the first structure formed by etching, a process for opening a window to define the second structure in the etching mask on the substrate, and a process for forming the second structure (505) by etching. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005051253(A) 申请公布日期 2005.02.24
申请号 JP20040242184 申请日期 2004.08.23
申请人 IC SENSORS INC 发明人 JERMAN JOHN H
分类号 B81C1/00;H01L21/306;H01L21/308;(IPC1-7):H01L21/306 主分类号 B81C1/00
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