发明名称 |
Resist composition and patterning process |
摘要 |
A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
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申请公布号 |
US2008096131(A1) |
申请公布日期 |
2008.04.24 |
申请号 |
US20070976279 |
申请日期 |
2007.10.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;KUSAKI WATARU;HARADA YUJI;YOSHIHARA TAKAO |
分类号 |
G03C1/00;G03C5/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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