| 发明名称 |
Organometallic compounds |
| 摘要 |
Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices.
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| 申请公布号 |
US2009156852(A1) |
申请公布日期 |
2009.06.18 |
| 申请号 |
US20080228346 |
申请日期 |
2008.08.12 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
SHENAI-KHATKHATE DEODATTA VINAYAK;POWER MICHAEL BRENDAN |
| 分类号 |
C07F7/30;C07C391/00;C07C395/00;C07F7/08;C23C16/18;C23C16/28;C23C16/30;H01L21/205 |
主分类号 |
C07F7/30 |
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