| 摘要 |
PROBLEM TO BE SOLVED: To provide aminosilane precursors for depositing silicon-containing films, and methods for depositing the silicon-containing films from these aminosilane precursors.SOLUTION: The aminosilane precursor for depositing a silicon-containing film is provided that is represented by the following formula (I): (RRN)SiR(I) (where, substituents R, Rare each independently chosen from a C1 to 20 alkyl group, and a C6 to 30 aryl group; at least one of the substituents R, Rcomprises an electron-withdrawing substituent chosen from F, Cl, Br, I, CN, NO, PO(OR), OR, RCOO, SO, SO, and SOR; Ris chosen from H, a C1 to 20 alkyl group, and a C6 to 12 aryl group; and n is a number ranging from 1 to 4).SELECTED DRAWING: None |
