| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad having no problems such as end part sagging, the occurrence of polishing flaws and the deterioration of a polishing rate with time relating to the polishing pad having a polishing layer including a polyurethane foam used for polishing the surface of a polishing object such as a magnetic disk substrate, an optical lens, a semiconductor wafer and the like, especially the surface of the magnetic disk substrate.SOLUTION: A polishing pad having a polishing layer including a polyurethane foam has a Shore A hardness of 25-50° and a tear strength of 0.24 kgf/mm or higher.SELECTED DRAWING: None |
