发明名称 3D Microscope And Methods Of Measuring Patterned Substrates
摘要 A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
申请公布号 US2016252714(A1) 申请公布日期 2016.09.01
申请号 US201615150411 申请日期 2016.05.09
申请人 Zeta Instruments, Inc. 发明人 Hou Zhen;Xu James Jianguo;Lee Ken Kinsun;Stainton James Nelson;Nguyen Hung Phi;Kudinar Rusmin;Soetarman Ronny
分类号 G02B21/00;G06T7/00 主分类号 G02B21/00
代理机构 代理人
主权项 1. A 3D microscope for patterned substrate measurement, the 3D microscope comprising: an objective lens; a reflected illuminator configured to provide reflected light for a sample including a patterned substrate and to project an image of a patterned article onto and remove the image of the patterned article from a focal plane of the objective lens; a transmitted illuminator configured to provide transmitted illumination for the sample; a focusing adjustment device for automating objective lens focus adjustment at a plurality of Z steps; an optical sensor capable of acquiring images at each Z step; and a processor for controlling the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor, the processor configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
地址 San Jose CA US