| 摘要 |
PURPOSE: The heat processing device is provided to exhaust the gas in the thermal processing chamber to the outside of the thermal processing chamber. CONSTITUTION: The thermal processing device(1) includes a heat treatment chamber(13), a plurality of entrances, and exhaust unit(21). The thermal processing chamber accommodates the object to be heated. The plurality of entrances make the object enter to the heat treatment chamber. The exhaust means changes the exhaustion ability for ejecting/inhaling the gas from the inside of the heat treatment chamber to the outside. The exhaustion ability adjusts the pressure at the gateway. The thermal processing device discharge the gas from the inside of the heat treatment chamber to the outside through the exhaust unit. The plurality of entrances is arranged to the area(A(X1)) close to the exhaust unit and the area(B(X2)) far from the area(A(X1)). The plurality of entrances is arranged side by side. The area(B(X2)) is positioned in the upward of the area(A(X1)). The exhaustion ability of the exhaust unit is completed before one of entrances is opened. |
