ADJUSTING SYSTEM COMPONENT, MODULE, MIRROR ARRANGEMENT AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY

摘要

The invention relates to an adjusting system component (1, 1', 1'') comprising at least one transmission (2, 2', 2'') in the form of a spherical transmission having two or three degrees of freedom of movement, said transmission comprising a transmission output member (4) which can be moved along an imaginary spherical surface (K). The invention also relates to a module, a mirror arrangement and to a projection exposure installation for microlithography using said type of adjusting system component.