SUBSTRATE PROCESSING APPARATUS

摘要

In a substrate processing apparatus, chucks and engagement parts are disposed on the upper surface of a holding base part that extends radially outward of a base supporter, and the engagement parts are located radially outward of the chucks. A generally annular lower protruding part extends radially outward from the base supporter below the holding base part. In a cup part, a guard for receiving a processing liquid from a substrate is switched between a first guard and a second guard by a guard moving mechanism moving the first guard in the up-down direction between a liquid receiving position and a retracted position. With the first guard located at the retracted position, the lower protruding part extends toward the inner peripheral edge of a first-guard canopy part. This configuration suppresses the flow of a gas between the first guard and the second guard.

主权项

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holder for holding a substrate in a horizontal position; an opposing member that is held by said substrate holder, opposes an upper surface of said substrate, and has an opposing-member opening in a central part; a substrate rotation mechanism disposed below said substrate holder and for rotating said substrate and said opposing member along with said substrate holder about a central axis pointing in an up-down direction; a rotation-mechanism housing part for housing said substrate rotation mechanism below said substrate holder; a processing liquid supply part for supplying a processing liquid to said upper surface of said substrate through said opposing-member opening; and a cup part disposed around said substrate holder and for receiving a processing liquid from said substrate, wherein said substrate holder includes: a base supporter; a disk-shaped holding base part supported from below by said base supporter and extending radially outward of said base supporter; a plurality of chucks that are disposed on an upper surface of said holding base part and support said substrate; and an opposing-member supporter that is disposed radially outward of said plurality of chucks on said upper surface of said holding base part and supports said opposing member, said cup part includes: a first guard having a cylindrical first-guard side wall part and an annular plate-like first-guard canopy part that extends radially inward from an upper end portion of said first-guard side wall part; a second guard having a cylindrical second-guard side wall part that is located radially outward of said first-guard side wall part, and an annular plate-like second-guard canopy part that extends radially inward from an upper end portion of said second-guard side wall part above said first-guard canopy part; a guard moving mechanism for switching a guard for receiving a processing liquid from said substrate between said first guard and said second guard by moving said first guard in said up-down direction between a liquid receiving position at which said first guard receives the processing liquid from said substrate and a retracted position that is below said liquid receiving position; and a discharge port through which gas in said first guard and said second guard is exhausted, an inner diameter of said first-guard canopy part and an inner diameter of said second-guard canopy part are greater than an outer diameter of said holding base part and an outer diameter of said opposing member, and an annular lower protruding part is provided to extend radially outward from either said base supporter or said rotation-mechanism housing part below said holding base part toward an inner peripheral edge of said first-guard canopy part in a state in which said first guard is located at said retracted position.