发明名称 MICRO PHOTOLUMINESCENCE IMAGING WITH OPTICAL FILTERING
摘要 A method that includes: illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer; filtering photoluminescence emitted from a portion of the wafer in response to the illumination; directing the filtered photoluminescence onto a detector to image the portion of the wafer on the detector with a spatial resolution of 1 μm×1 μm or smaller; and identifying one or more crystallographic defects in the wafer based on the detected filtered photoluminescence.
申请公布号 US2016327485(A1) 申请公布日期 2016.11.10
申请号 US201514879522 申请日期 2015.10.09
申请人 Semilab SDI LLC 发明人 Kiss Zoltan Tamas;Dudas Laszlo;Nadudvari Gyorgy;Laurent Nicolas;Jastrzebski Lubomir L.
分类号 G01N21/64;G01N21/95 主分类号 G01N21/64
代理机构 代理人
主权项 1. A method comprising: illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer; filtering photoluminescence emitted from a portion of the wafer in response to the illumination; directing the filtered photoluminescence onto a detector to image the portion of the wafer on the detector with a spatial resolution of 1 μm×1 μm or smaller; and identifying one or more crystallographic defects in the wafer based on the detected filtered photoluminescence.
地址 Tampa FL US