发明名称 OPTICAL COMPONENT, INFRARED CAMERA, AND METHOD FOR MANUFACTURING OPTICAL COMPONENT
摘要 The invention provides an optical component, an infrared camera including the optical component, and a method for manufacturing the optical component. Antireflection materials 3A are formed on a chalcogenide glass 2 of which a compositional ratio of germanium and selenium is 60 percent or greater. With respect to the antireflection materials 3A, an extinction coefficient to light of 10.5 μm is 0.01 or less, and a refractive index to light having a wavelength of 10.5 μm are greater than 1 and 2.6 or less. The antireflection materials 3A are formed on a surface of a chalcogenide glass 2 at an interval of 0.5 μm to 2.0 μm, so as to form an antireflection film 3. Adhesiveness of the antireflection film 3 is higher than that In a case where the surface of the chalcogenide glass 2 is evenly coated with the antireflection materials 3A.
申请公布号 US2016356926(A1) 申请公布日期 2016.12.08
申请号 US201615244299 申请日期 2016.08.23
申请人 FUJIFILM Corporation 发明人 TAKAHASHI Hiroki;KANAYA Mototaka
分类号 G02B1/118;H04N5/33;C03C17/00;G02B1/113 主分类号 G02B1/118
代理机构 代理人
主权项 1. An optical component, comprising: a chalcogenide glass with a content ratio of germanium and selenium is 60 percent or greater; and an antireflection film in which a plurality of antireflection materials including diamond-like carbon particles or carbon particles, of which an extinction coefficient to light having a wavelength of 10.5 μm is 0.01 or less, and a refractive index to light having a wavelength of 10.5 μm is greater than 1 and 2.6 or less are formed on a surface of the chalcogenide glass at a regular interval of 0.5 μm to 2.0 μm along the surface, wherein the plurality of antireflection materials have same size and same shape with each other, an air layer is formed between the plurality of antireflection materials, and an equivalent refractive index of the antireflection film to light having a wavelength of 10.5 μm is 1.4 to 1.9 that is determined by an area ratio of the antireflection material occupying in a unit area of the antireflection film, is obtained by the antireflection materials and the air layer.
地址 Tokyo JP