发明名称 |
HIGH QUALITY SILICON SINGLE CRYSTALLINE INGOT PRODUCING METHOD, APPARATUS FOR GROWING THE SAME, INGOT, AND WAFER |
摘要 |
A high quality silicon single crystalline ingot manufacturing method, a growing apparatus, and ingot and wafer obtained therefrom are provided to acquire silicon ingot having a variety of oxygen concentration by controlling a temperature distribution of silicon melt using an unbalanced magnetic field. An unbalanced magnetic field is applied to a silicon melt of a crucible(20). The unbalanced magnetic field is formed by controlling differently an upper magnetic field and a lower magnetic field. The upper magnetic field is formed at an upper portion of the crucible. The lower magnetic field is formed at lower and round portions of the crucible. |
申请公布号 |
KR20070013642(A) |
申请公布日期 |
2007.01.31 |
申请号 |
KR20050068097 |
申请日期 |
2005.07.26 |
申请人 |
SILTRON INC. |
发明人 |
CHO, HYON JONG;HONG, YOUNG HO |
分类号 |
C30B15/00 |
主分类号 |
C30B15/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|