发明名称 HIGH QUALITY SILICON SINGLE CRYSTALLINE INGOT PRODUCING METHOD, APPARATUS FOR GROWING THE SAME, INGOT, AND WAFER
摘要 A high quality silicon single crystalline ingot manufacturing method, a growing apparatus, and ingot and wafer obtained therefrom are provided to acquire silicon ingot having a variety of oxygen concentration by controlling a temperature distribution of silicon melt using an unbalanced magnetic field. An unbalanced magnetic field is applied to a silicon melt of a crucible(20). The unbalanced magnetic field is formed by controlling differently an upper magnetic field and a lower magnetic field. The upper magnetic field is formed at an upper portion of the crucible. The lower magnetic field is formed at lower and round portions of the crucible.
申请公布号 KR20070013642(A) 申请公布日期 2007.01.31
申请号 KR20050068097 申请日期 2005.07.26
申请人 SILTRON INC. 发明人 CHO, HYON JONG;HONG, YOUNG HO
分类号 C30B15/00 主分类号 C30B15/00
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