| 发明名称 |
VACUUM EVAPORATION DEVICE AND VACUUM EVAPORATION METHOD |
| 摘要 |
The present disclosure provides a vacuum evaporation device, including: a substrate driving mechanism for supporting and moving a substrate; a first mask plate driving mechanism for supporting and moving a first mask plate located below the substrate; a second mask plate driving mechanism for supporting and moving a second mask plate located below the first mask plate, the second mask plate driving mechanism cooperating with the first mask plate driving mechanism so as to change an overlapping state of mask plate pattern regions of the first mask plate and the second mask plate; and an evaporation source located below the second mask plate. |
| 申请公布号 |
US2016355923(A1) |
申请公布日期 |
2016.12.08 |
| 申请号 |
US201414436360 |
申请日期 |
2014.08.05 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO. LTD. |
发明人 |
MU Junying;MA Dawei |
| 分类号 |
C23C14/04;C23C14/50;C23C14/54;C23C14/24 |
主分类号 |
C23C14/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A vacuum evaporation device, comprising:
a substrate driving mechanism for supporting and moving a substrate; a first mask plate driving mechanism for supporting and moving a first mask plate located below the substrate; a second mask plate driving mechanism for supporting and moving a second mask plate located below the first mask plate; and an evaporation source located below the second mask plate. |
| 地址 |
Beijing CN |
