发明名称 TERMINATION AND CONTACT STRUCTURES FOR A HIGH VOLTAGE GAN-BASED HETEROJUNCTION TRANSISTOR
摘要 A semiconductor device is provided that includes a substrate, a first active layer disposed over the substrate, and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. A termination layer, which is disposed on the second active layer, includes InGaN. Source, gate and drain contacts are disposed on the termination layer.
申请公布号 WO2008116040(A1) 申请公布日期 2008.09.25
申请号 WO2008US57602 申请日期 2008.03.20
申请人 VELOX SEMICONDUCTOR CORPORATION;MURPHY, MICHAEL;POPHRISTIC, MILAN 发明人 MURPHY, MICHAEL;POPHRISTIC, MILAN
分类号 H01L29/205 主分类号 H01L29/205
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