| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus in which the occurrence of thermal expansion/contraction effects are reduced; and specifically, a system configured to reduce thermal expansion/contraction effects in an immersion system which uses a supply system which provides immersion fluid to a localized area of a substrate and/or substrate table.SOLUTION: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent to the substrate supporting area.SELECTED DRAWING: Figure 9 |
