| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE |
| 摘要 |
A radiation-sensitive resin composition containing an alicyclic olefin polymer which has an acidic group (A), a sulfonium salt-based photoacid generator (B) which is represented by the following general formula (1), and a cross-linking agent (C) is provided.;;(In the above general formula (1), R1, R2, and R3 respectively independently are a C6 to C30 aryl group, C4 to C30 heterocyclic group, C1 to C30 alkyl group, C2 to C30 alkenyl group, or C2 to C30 alkynyl group, the groups being optionally substituted, and “a” is an integer of 1 to 5.) |
| 申请公布号 |
US2016202607(A1) |
申请公布日期 |
2016.07.14 |
| 申请号 |
US201414913489 |
申请日期 |
2014.09.02 |
| 申请人 |
ZEON CORPORATION |
发明人 |
Abe Satoshi |
| 分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A radiation-sensitive resin composition comprising an alicyclic olefin polymer having an acidic group (A), a sulfonium salt-based photoacid generator (B) represented by the following general formula (1), and a cross-linking agent (C),
wherein, in the general formula (1), R1, R2, and R3 respectively independently are a C6 to C30 aryl group, C4 to C30 heterocyclic group, C1 to C30 alkyl group, C2 to C30 alkenyl group, or C2 to C30 alkynyl group, the groups being optionally substituted, and “a” is an integer of 1 to 5. |
| 地址 |
Tokyo JP |
