CHEMICALLY AMPLIFIED RADIATION SENSITIVE COMPOSITION CONTAINING ONIUM SALT TYPE PHOTOACID GENERATOR

摘要

A CHEMICALLY AMPLIFIED RADIATION SENSITIVE COMPOSITION IS PROVIDED WHICH COMPRISES A FILM FORMING HYDROXYSTRYRENE BASED RESIN IN COMBINATION WITH AN ONIUM SALT PRECURSOR WHICH GENERATES A FLUORINATED ALKANESULFONIC ACID AS A PHOTOACID GENERATOR. THIS COMPOSITION CAN REALIZE NEITHER CORROSION OF APPARATUSES BY OUTGAS, NOR T-SHAPED PATTERN PROFILES, NOR CHANGE IN LINEWIDTH ATTRIBUTABLE TO PROCESS TIME DELAY TIME DELAY, ON THE OTHER SIDE, HIGHSENSITIVITY AND RESOLUTION, AND GOOD PATTERN PROFILES AND STABILITY THEREOF.