| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photo-spacer having superior flexibility and elastic restoring characteristics in its curing matter by making alkali development good. <P>SOLUTION: The photosensitive resin composition for the photo-spacer (Q) contains a hydrophilic resin (A), a multi-functional (meta)acrylate monomer (B), inorganic particulates (C) having 1-200 nm of a volume average particle size, and a radical photopolymerization-initiator (D). The inorganic particulates (C) has at least one functional group selected from a group consisting of a (meta)acryloyl group, a vinyl group, a glycidyl group, a mercapto group, and an amino group on the surface. <P>COPYRIGHT: (C)2009,JPO&INPIT |
