发明名称 基板洗浄方法、基板洗浄システムおよび記憶媒体
摘要 A method for cleaning a substrate, includes supplying to a substrate having a hydrophilic surface a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the hydrophilic surface of the substrate, and supplying to the substrate having the processing film a strip-processing liquid for stripping the processing film from the substrate.
申请公布号 JP5977727(B2) 申请公布日期 2016.08.24
申请号 JP20130234897 申请日期 2013.11.13
申请人 東京エレクトロン株式会社 发明人 金子 都;田内 啓士;折居 武彦;菅野 至
分类号 H01L21/304;C11D3/37;C11D17/00;H01L21/027 主分类号 H01L21/304
代理机构 代理人
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