METHOD AND APPARATUS OF DEVELOPING SUBSTRATE

摘要

A substrate developing method and an apparatus are provided to perform the photolithography process by removing the particles adhered to the developing nozzle. A substrate developing method comprises a step for separating a developing nozzle; a step for coating the developer; and a step for binding the developing nozzle; and a step for washing the developing nozzle. Before coating the developer, the developing nozzle(120) is arranged in the first waiting part(130) positioned at the neighboring of the substrate support portion(110). The first waiting part is arranged to face the second waiting part(140) positioned at the neighboring of the substrate support portion. The developing nozzle is separated from the first waiting part in order to coat the developer. The developing nozzle is moved to the second waiting part from the first waiting part. The developer is coated on a substrate(111) through the developing nozzle. The developing nozzle is combined to the second waiting part after coating the developer. The developing nozzle is washed in the second waiting part.