发明名称 Hybrid Bonding with Air-Gap Structure
摘要 A package component includes a surface dielectric layer having a first planar surface, and a metal pad in the surface dielectric layer. The metal pad includes a diffusion barrier layer that includes sidewall portions, and a metallic material encircled by the sidewall portions of the diffusion barrier layer. The metallic material has a second planar surface level with the first planar surface. An air gap extends from the second planar surface of the metallic material into the metallic material. An edge of the air gap is aligned to an edge of the metallic material.
申请公布号 US2016197049(A1) 申请公布日期 2016.07.07
申请号 US201615071576 申请日期 2016.03.16
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chen Szu-Ying;Yaung Dun-Nian
分类号 H01L23/00;H01L23/532;H01L23/522 主分类号 H01L23/00
代理机构 代理人
主权项 1. A method comprising: performing a first Chemical Mechanical Polish (CMP) on surface features of a first package component, wherein the surface features comprise a first metal pad encircled by a first surface dielectric layer, and the first CMP is performed using a first slurry; performing a second CMP on the surface features of the first package component using a second slurry different from the first slurry; and bonding the first package component to a second package component, wherein the first metal pad is bonded to a second metal pad of the second package component, and the first surface dielectric layer is bonded to a second surface dielectric layer of the second package component.
地址 Hsin-Chu TW