发明名称 LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic method and a lithographic apparatus which can shorten the updating time of a spatial optical modulation element. <P>SOLUTION: Only 192 rows from among 768 rows, arranged along the scanning direction of a DMD 50, are used; and furthermore, the 192 rows are divided into 5 regions (region 1 to 5), a control signal is sequentially transmitted from the region 1 to the region 5, and the resetting of the micro-mirrors is sequentially performed, starting from the region where the transmission of control signal has been finished. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008098659(A) 申请公布日期 2008.04.24
申请号 JP20070311939 申请日期 2007.12.03
申请人 FUJIFILM CORP 发明人 NAKATANI DAISUKE;SHIMOYAMA YUJI;SUMI KATSUTO;FUJII TAKESHI
分类号 B41J2/01;H01L21/027;B41J2/44;B41J2/445;B41J2/45;B41J2/455;B41J2/465;G02B26/08;G03F7/20;G06K15/12;H04N1/113;H05K3/00 主分类号 B41J2/01
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