| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device manufacturing method and a substrate. <P>SOLUTION: A substrate W is provided with a coating 4 of a material which is substantially transparent to a wavelength of a projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating 4 such that the wavelength of the projection beam is shortened as the projection beam passes through the coating. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
