发明名称 METHOD OF INSPECTING CERAMIC COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a ceramic component for a semiconductor manufacturing apparatus small in organic material soiling by inspecting the ceramic component small in the soiling to a treated material in the ceramic component to be used under a reduced pressure environment. <P>SOLUTION: The ceramic component for the semiconductor manufacturing apparatus has &ge;98% sintered compact density and &le;5 mass% carbon originating from adsorbed organic materials which is detected at a depth &ge;5 nm from the surface in the measurement in the depth direction from the surface by an X-ray photoelectronic spectroscopy. The ceramic component for the semiconductor manufacturing apparatus has &le;Ra1 &mu;m surface smoothness in the main surface roughness exposed in a treatment chamber of the semiconductor manufacturing apparatus. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007217207(A) 申请公布日期 2007.08.30
申请号 JP20060037538 申请日期 2006.02.15
申请人 TAIHEIYO CEMENT CORP;NIHON CERATEC CO LTD 发明人 ISHIDA HIRONORI;HARADA TAMOTSU;MATSUO HIROYUKI
分类号 C04B35/00;G01N23/227 主分类号 C04B35/00
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