发明名称 |
METHOD OF INSPECTING CERAMIC COMPONENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a ceramic component for a semiconductor manufacturing apparatus small in organic material soiling by inspecting the ceramic component small in the soiling to a treated material in the ceramic component to be used under a reduced pressure environment. <P>SOLUTION: The ceramic component for the semiconductor manufacturing apparatus has ≥98% sintered compact density and ≤5 mass% carbon originating from adsorbed organic materials which is detected at a depth ≥5 nm from the surface in the measurement in the depth direction from the surface by an X-ray photoelectronic spectroscopy. The ceramic component for the semiconductor manufacturing apparatus has ≤Ra1 μm surface smoothness in the main surface roughness exposed in a treatment chamber of the semiconductor manufacturing apparatus. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007217207(A) |
申请公布日期 |
2007.08.30 |
申请号 |
JP20060037538 |
申请日期 |
2006.02.15 |
申请人 |
TAIHEIYO CEMENT CORP;NIHON CERATEC CO LTD |
发明人 |
ISHIDA HIRONORI;HARADA TAMOTSU;MATSUO HIROYUKI |
分类号 |
C04B35/00;G01N23/227 |
主分类号 |
C04B35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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