发明名称 |
GROUP III NITRIDE SUBSTRATES AND THEIR FABRICATION METHOD |
摘要 |
Group III nitride substrate having a first side of nonpolar or semipolar plane and a second side has more than one stripe of metal buried, wherein the stripes are perpendicular to group III nitride's c-axis. More than 90% of stacking faults exist over metal stripes. Second side may expose a nonpolar or semipolar plane. Also disclosed is a group III nitride substrate having a first side of nonpolar or semipolar plane and a second side with exposed nonpolar or semipolar plane. The substrate contains bundles of stacking faults with spacing larger than 1 mm. The invention also provides methods of fabricating the group III nitride substrates above. |
申请公布号 |
US2016163801(A1) |
申请公布日期 |
2016.06.09 |
申请号 |
US201514959476 |
申请日期 |
2015.12.04 |
申请人 |
SIXPOINT MATERIALS, INC. ;SEOUL SEMICONDUCTOR CO., LTD. |
发明人 |
HASHIMOTO Tadao |
分类号 |
H01L29/20;H01L29/04 |
主分类号 |
H01L29/20 |
代理机构 |
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代理人 |
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主权项 |
1. A crystalline group III nitride substrate comprising,
(a) a first side exposing nonpolar or semipolar plane of group III nitride; (b) a second side opposite to the first side exposing nonpolar or semipolar plane of group III nitride; (c) bundles of stacking faults perpendicular to c-axis with separation larger than 1 mm. |
地址 |
Buellton CA US |