发明名称 GROUP III NITRIDE SUBSTRATES AND THEIR FABRICATION METHOD
摘要 Group III nitride substrate having a first side of nonpolar or semipolar plane and a second side has more than one stripe of metal buried, wherein the stripes are perpendicular to group III nitride's c-axis. More than 90% of stacking faults exist over metal stripes. Second side may expose a nonpolar or semipolar plane. Also disclosed is a group III nitride substrate having a first side of nonpolar or semipolar plane and a second side with exposed nonpolar or semipolar plane. The substrate contains bundles of stacking faults with spacing larger than 1 mm. The invention also provides methods of fabricating the group III nitride substrates above.
申请公布号 US2016163801(A1) 申请公布日期 2016.06.09
申请号 US201514959476 申请日期 2015.12.04
申请人 SIXPOINT MATERIALS, INC. ;SEOUL SEMICONDUCTOR CO., LTD. 发明人 HASHIMOTO Tadao
分类号 H01L29/20;H01L29/04 主分类号 H01L29/20
代理机构 代理人
主权项 1. A crystalline group III nitride substrate comprising, (a) a first side exposing nonpolar or semipolar plane of group III nitride; (b) a second side opposite to the first side exposing nonpolar or semipolar plane of group III nitride; (c) bundles of stacking faults perpendicular to c-axis with separation larger than 1 mm.
地址 Buellton CA US